Entegris Launches Oktolex™ Membrane Technology To Improve Yield In ArF, KrF, And EUV Lithography For Logic, DRAM, And 3D NAND Devices


“Breaking from convention, we’ve developed a cleaner, faster, and more effective way to remove the most challenging contaminants with a tailored approach to the specific contamination control needs of ArF, KrF, and EUV applications for Logic, DRAM, and 3D NAND devices,” noted Entegris Senior Vice President and General Manager of Microcontamination Control, Clint Haris. “The true advantage of this technology is its ability to create membranes that effectively remove the targeted contaminants, while not altering the chemical composition. This combination enables us to collaborate with customers to create precise contaminant removal solutions that meet the needs of advanced nodes and reduce tool downtime.”

Oktolex technology is currently available in Entegris Impact® 8G point-of-use photochemical filters.

For more information, please visit the Entegris product display area, booth #176, during
SEMICON Taiwan, Sept. 13-15, 2017, at the Taipei Nangang Exhibition Center, or visit www.entegris.com/Impact8GFilters.

About Entegris

Entegris is a leading specialty materials provider for the microelectronics industry and other high-tech industries. Entegris is ISO-9001 certified and has manufacturing, customer service and/or research facilities in the United States, China, France, Germany, Israel, Japan, Malaysia, Singapore, South Korea and Taiwan. Additional information may be found at www.entegris.com.

Media Contact: Asia & Japan
Ina Chu
+1 217 766 1011

Media Contact: U.S. & Europe
Andy Lucich
+1 602 502 1397

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SOURCE Entegris Inc.

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